Intel Sees a Clear Path to 10nm Fabrication Process
Written on July 5, 2008 – 1:14 pm | by admin
Pat Gelsinger of Intel says that they will be in a position to shrink their chips to a 10 nanometer silicon fabrication process within the next ten years.
Referring to Intel co-founder Gordon Moore and his famous law, Gelsinger said: “There was a time where Intel and his colleagues wondered whether they could reach 100nm chips.” continued, “But we did do that, and today we see a clear way to get to under 10 nanometers. With Moore’s Law we always have about 10 years of visibility into the future, so beyond 10 nanometers, we’re not sure how we’ll do it”.
Gelsinger said that “We are putting more and more of the periodic table onto that silicon scaffolding. Today we use about half of the elements on the periodic table. When [Intel co-founder Robert] Noyce and Moore started, they used six elements, more elements have to be added to facilitate such a shrink”.
Source: CHW
Tags: 10nm, chip, intel